Exploitation of atomic layer deposition for nanostructured materials

Markku Leskelä, Marianna Kemell, Kaupo Kukli, Viljami Pore, Eero Santala, Jun Lu, Mikko Ritala

    Forskningsoutput: TidskriftsbidragÖversiktsartikelPeer review

    Sammanfattning

    In making and modifying nanomaterials conformality is a prerequisite for the thin film deposition method. From its principle ALD is an ideal method for coating nanomaterials. In this paper the use of ALD for making nanostructured materials is exemplified by many ways: making of nanolaminates, deposition of thin films inside nanopores, as well as coating of nanofibers and nanorods. The materials deposited by ALD are mostly oxides, nitrides and metals. (C) 2006 Elsevier B.V. All rights reserved.
    Originalspråkengelska
    TidskriftMaterials Science & Engineering. C, Biomimetic Materials, Sensors and Systems
    Volym27
    Sidor (från-till)1504-1508
    Antal sidor5
    ISSN0928-4931
    DOI
    StatusPublicerad - 2007
    MoE-publikationstypA2 Granska artikel i en vetenskaplig tidskrift

    Vetenskapsgrenar

    • 116 Kemi
    • ALD
    • nanomaterials
    • nanolaminates
    • nanofibers
    • nanotubes
    • porous materials
    • thin films

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