Heteroleptic Precursors for Atomic Layer Deposition

J. Niinisto, T. Blanquart, S. Seppala, M. Ritala, M. Leskela

Forskningsoutput: Kapitel i bok/rapport/konferenshandlingKonferensbidragVetenskapligPeer review

Originalspråkengelska
Titel på gästpublikationAtomic Layer Deposition Applications 10
RedaktörerF Roozeboom, S DeGendt, A Delabie, JW Elam, A Londergan, O VanDerStraten
Antal sidor12
FörlagELECTROCHEMICAL SOC INC
Utgivningsdatum2014
Sidor221-232
ISBN (tryckt)978-1-62332-189-5
ISBN (elektroniskt)978-1-60768-546-3
DOI
StatusPublicerad - 2014
MoE-publikationstypA4 Artikel i en konferenspublikation
EvenemangInternational Symposium on Atomic Layer Deposition Applications - Cancun, Mexiko
Varaktighet: 5 okt 20149 okt 2014
Konferensnummer: 10

Publikationsserier

NamnECS Transactions
FörlagELECTROCHEMICAL SOC INC
Nummer9
Volym64
ISSN (tryckt)1938-5862

Vetenskapsgrenar

  • 116 Kemi
  • 114 Fysik

Citera det här

Niinisto, J., Blanquart, T., Seppala, S., Ritala, M., & Leskela, M. (2014). Heteroleptic Precursors for Atomic Layer Deposition. I F. Roozeboom, S. DeGendt, A. Delabie, JW. Elam, A. Londergan, & O. VanDerStraten (Red.), Atomic Layer Deposition Applications 10 (s. 221-232). (ECS Transactions; Vol. 64, Nr. 9). ELECTROCHEMICAL SOC INC. https://doi.org/10.1149/06409.0221ecst
Niinisto, J. ; Blanquart, T. ; Seppala, S. ; Ritala, M. ; Leskela, M. / Heteroleptic Precursors for Atomic Layer Deposition. Atomic Layer Deposition Applications 10. redaktör / F Roozeboom ; S DeGendt ; A Delabie ; JW Elam ; A Londergan ; O VanDerStraten. ELECTROCHEMICAL SOC INC, 2014. s. 221-232 (ECS Transactions; 9).
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title = "Heteroleptic Precursors for Atomic Layer Deposition",
keywords = "OXIDE THIN-FILMS, CYCLOPENTADIENYL PRECURSORS, WATER, GROWTH, HAFNIUM, ALD, 116 Chemical sciences, 114 Physical sciences",
author = "J. Niinisto and T. Blanquart and S. Seppala and M. Ritala and M. Leskela",
note = "Volume: Proceeding volume:",
year = "2014",
doi = "10.1149/06409.0221ecst",
language = "English",
isbn = "978-1-62332-189-5",
series = "ECS Transactions",
publisher = "ELECTROCHEMICAL SOC INC",
number = "9",
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editor = "F Roozeboom and S DeGendt and A Delabie and JW Elam and A Londergan and O VanDerStraten",
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Niinisto, J, Blanquart, T, Seppala, S, Ritala, M & Leskela, M 2014, Heteroleptic Precursors for Atomic Layer Deposition. i F Roozeboom, S DeGendt, A Delabie, JW Elam, A Londergan & O VanDerStraten (red), Atomic Layer Deposition Applications 10. ECS Transactions, nr. 9, vol. 64, ELECTROCHEMICAL SOC INC, s. 221-232, International Symposium on Atomic Layer Deposition Applications, Cancun, Mexiko, 05/10/2014. https://doi.org/10.1149/06409.0221ecst

Heteroleptic Precursors for Atomic Layer Deposition. / Niinisto, J.; Blanquart, T.; Seppala, S.; Ritala, M.; Leskela, M.

Atomic Layer Deposition Applications 10. red. / F Roozeboom; S DeGendt; A Delabie; JW Elam; A Londergan; O VanDerStraten. ELECTROCHEMICAL SOC INC, 2014. s. 221-232 (ECS Transactions; Vol. 64, Nr. 9).

Forskningsoutput: Kapitel i bok/rapport/konferenshandlingKonferensbidragVetenskapligPeer review

TY - GEN

T1 - Heteroleptic Precursors for Atomic Layer Deposition

AU - Niinisto, J.

AU - Blanquart, T.

AU - Seppala, S.

AU - Ritala, M.

AU - Leskela, M.

N1 - Volume: Proceeding volume:

PY - 2014

Y1 - 2014

KW - OXIDE THIN-FILMS

KW - CYCLOPENTADIENYL PRECURSORS

KW - WATER

KW - GROWTH

KW - HAFNIUM

KW - ALD

KW - 116 Chemical sciences

KW - 114 Physical sciences

U2 - 10.1149/06409.0221ecst

DO - 10.1149/06409.0221ecst

M3 - Conference contribution

SN - 978-1-62332-189-5

T3 - ECS Transactions

SP - 221

EP - 232

BT - Atomic Layer Deposition Applications 10

A2 - Roozeboom, F

A2 - DeGendt, S

A2 - Delabie, A

A2 - Elam, JW

A2 - Londergan, A

A2 - VanDerStraten, O

PB - ELECTROCHEMICAL SOC INC

ER -

Niinisto J, Blanquart T, Seppala S, Ritala M, Leskela M. Heteroleptic Precursors for Atomic Layer Deposition. I Roozeboom F, DeGendt S, Delabie A, Elam JW, Londergan A, VanDerStraten O, redaktörer, Atomic Layer Deposition Applications 10. ELECTROCHEMICAL SOC INC. 2014. s. 221-232. (ECS Transactions; 9). https://doi.org/10.1149/06409.0221ecst