Impact of Atomic Layer Deposition Chemistry to the Quality of High-Permittivity Metal Oxide Thin Solid Films

    Forskningsoutput: Kapitel i bok/rapport/konferenshandlingKapitelVetenskapligPeer review

    Originalspråkengelska
    Titel på gästpublikationNew Materials and Processes for Incoming Semiconductor Technologies
    RedaktörerSalvador Dueñas, H Castán
    UtgivningsortTrivandrum, Kerala, India
    FörlagTransworld Research Network
    Utgivningsdatum2006
    Sidor1-40
    StatusPublicerad - 2006
    MoE-publikationstypA3 Del av bok eller annan forskningsbok

    Vetenskapsgrenar

    • 116 Kemi

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    Kukli, K., Ritala, M., & Leskelä, M. (2006). Impact of Atomic Layer Deposition Chemistry to the Quality of High-Permittivity Metal Oxide Thin Solid Films . I S. Dueñas, & H. Castán (Red.), New Materials and Processes for Incoming Semiconductor Technologies (s. 1-40). Trivandrum, Kerala, India: Transworld Research Network.
    Kukli, Kaupo ; Ritala, Mikko ; Leskelä, Markku. / Impact of Atomic Layer Deposition Chemistry to the Quality of High-Permittivity Metal Oxide Thin Solid Films . New Materials and Processes for Incoming Semiconductor Technologies. redaktör / Salvador Dueñas ; H Castán. Trivandrum, Kerala, India : Transworld Research Network, 2006. s. 1-40
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    title = "Impact of Atomic Layer Deposition Chemistry to the Quality of High-Permittivity Metal Oxide Thin Solid Films",
    keywords = "116 Chemical sciences",
    author = "Kaupo Kukli and Mikko Ritala and Markku Leskel{\"a}",
    year = "2006",
    language = "English",
    pages = "1--40",
    editor = "Salvador Due{\~n}as and H Cast{\'a}n",
    booktitle = "New Materials and Processes for Incoming Semiconductor Technologies",
    publisher = "Transworld Research Network",
    address = "India",

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    Kukli, K, Ritala, M & Leskelä, M 2006, Impact of Atomic Layer Deposition Chemistry to the Quality of High-Permittivity Metal Oxide Thin Solid Films . i S Dueñas & H Castán (red), New Materials and Processes for Incoming Semiconductor Technologies. Transworld Research Network, Trivandrum, Kerala, India, s. 1-40.

    Impact of Atomic Layer Deposition Chemistry to the Quality of High-Permittivity Metal Oxide Thin Solid Films . / Kukli, Kaupo; Ritala, Mikko; Leskelä, Markku.

    New Materials and Processes for Incoming Semiconductor Technologies. red. / Salvador Dueñas; H Castán. Trivandrum, Kerala, India : Transworld Research Network, 2006. s. 1-40.

    Forskningsoutput: Kapitel i bok/rapport/konferenshandlingKapitelVetenskapligPeer review

    TY - CHAP

    T1 - Impact of Atomic Layer Deposition Chemistry to the Quality of High-Permittivity Metal Oxide Thin Solid Films

    AU - Kukli, Kaupo

    AU - Ritala, Mikko

    AU - Leskelä, Markku

    PY - 2006

    Y1 - 2006

    KW - 116 Chemical sciences

    M3 - Chapter

    SP - 1

    EP - 40

    BT - New Materials and Processes for Incoming Semiconductor Technologies

    A2 - Dueñas, Salvador

    A2 - Castán, H

    PB - Transworld Research Network

    CY - Trivandrum, Kerala, India

    ER -

    Kukli K, Ritala M, Leskelä M. Impact of Atomic Layer Deposition Chemistry to the Quality of High-Permittivity Metal Oxide Thin Solid Films . I Dueñas S, Castán H, redaktörer, New Materials and Processes for Incoming Semiconductor Technologies. Trivandrum, Kerala, India: Transworld Research Network. 2006. s. 1-40