In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes

Heta-Elisa Nieminen; Mykhailo Chundak; Mikko J. Heikkila; Paloma Ruiz Karkkainen; Marko Vehkamaki; Matti Putkonen; Mikko Ritala

doi:10.1116/6.0002312

In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes

Heta-Elisa Nieminen, Mykhailo Chundak, Mikko J. Heikkila, Paloma Ruiz Karkkainen, Marko Vehkamaki, Matti Putkonen, Mikko Ritala

Forskningsoutput: Tidskriftsbidrag › Artikel › Vetenskaplig › Peer review

Originalspråk	engelska
Artikelnummer	022401
Tidskrift	Journal of vacuum science & technology : an official journal of the American Vacuum Society
Volym	41
Nummer	2
Antal sidor	11
ISSN	0734-2101
DOI	https://doi.org/10.1116/6.0002312
Status	Publicerad - mars 2023
MoE-publikationstyp	A1 Tidskriftsartikel-refererad

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116 Kemi

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10.1116/6.0002312

In vacuo cluster toolSlutlig publicerad version, 3,36 MBLicens: !!Unspecified

HelsinkiALD
Putkonen, M. (Chef), Ritala, M. (Chef), Mäntymäki, M. (Operatör), Kemell, M. (Operatör), Vehkamäki, M. (Operatör) & Heikkilä, M. (Operatör)
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Nieminen, H.-E., Chundak, M., Heikkila, M. J., Karkkainen, P. R., Vehkamaki, M., Putkonen, M., & Ritala, M. (2023). In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes. Journal of vacuum science & technology : an official journal of the American Vacuum Society, 41(2), Artikel 022401. https://doi.org/10.1116/6.0002312

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title = "In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes",

keywords = "Ray photoelectron-spectroscopy, Quartz-crystal microbalance, Al2o3 thin-films, Surface-chemistry, Interface formation, Mass-spectrometry, Alumina ald, Situ, Growth, Trimethylaluminum, 116 Chemical sciences",

author = "Heta-Elisa Nieminen and Mykhailo Chundak and Heikkila, {Mikko J.} and Karkkainen, {Paloma Ruiz} and Marko Vehkamaki and Matti Putkonen and Mikko Ritala",

year = "2023",

month = mar,

doi = "10.1116/6.0002312",

language = "English",

volume = "41",

journal = "Journal of vacuum science & technology : an official journal of the American Vacuum Society",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

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Nieminen, H-E , Chundak, M , Heikkila, MJ , Karkkainen, PR , Vehkamaki, M , Putkonen, M & Ritala, M 2023, 'In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes', Journal of vacuum science & technology : an official journal of the American Vacuum Society, vol. 41, nr. 2, 022401. https://doi.org/10.1116/6.0002312

In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes. / Nieminen, Heta-Elisa ; Chundak, Mykhailo ; Heikkila, Mikko J. et al.
I: Journal of vacuum science & technology : an official journal of the American Vacuum Society, Vol. 41, Nr. 2, 022401, 03.2023.

Forskningsoutput: Tidskriftsbidrag › Artikel › Vetenskaplig › Peer review

TY - JOUR

T1 - In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes

AU - Nieminen, Heta-Elisa

AU - Chundak, Mykhailo

AU - Heikkila, Mikko J.

AU - Karkkainen, Paloma Ruiz

AU - Vehkamaki, Marko

AU - Putkonen, Matti

AU - Ritala, Mikko

PY - 2023/3

Y1 - 2023/3

KW - Ray photoelectron-spectroscopy

KW - Quartz-crystal microbalance

KW - Al2o3 thin-films

KW - Surface-chemistry

KW - Interface formation

KW - Mass-spectrometry

KW - Alumina ald

KW - Situ

KW - Growth

KW - Trimethylaluminum

KW - 116 Chemical sciences

U2 - 10.1116/6.0002312

DO - 10.1116/6.0002312

M3 - Article

SN - 0734-2101

VL - 41

JO - Journal of vacuum science & technology : an official journal of the American Vacuum Society

JF - Journal of vacuum science & technology : an official journal of the American Vacuum Society

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In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes

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