@inproceedings{89f9b3bc4c074c1e9132a41ef7fc3ca2,
title = "New approaches to the atomic layer deposition of tantalum nitride and titanium nitride thin films ",
keywords = "116 Chemical sciences, atomic layer deposition , diffusion barrier , tantalum nitride , titanium nitride , trimethylaluminium , hydrazine , amine, atomic layer deposition , diffusion barrier , tantalum nitride , titanium nitride , trimethylaluminium , hydrazine , amine",
author = "Marika Juppo and Petra Al{\'e}n and Mikko Ritala and Markku Leskel{\"a}",
note = " Volume: Proceeding volume: ; Advanced Metallization Conference 2001 (AMC 2001) ; Conference date: 01-01-1800",
year = "2002",
language = "English",
pages = "633--639",
booktitle = "Conference Proceedings ULSI XVII",
}