@article{29f29cd61db84d7d934cc3f3fd24cbe1,
title = "Reductive Thermal Atomic Layer Deposition Process for Gold",
keywords = "116 Chemical sciences, Atomic layer deposition (ALD), Thin film deposition, Gold, Reducing agent",
author = "Anton Vihervaara and Timo Hatanp{\"a}{\"a} and Heta Nieminen and Kenichiro Mizohata and Mykhailo Chundak and Mikko Ritala",
year = "2023",
month = jan,
day = "11",
doi = "https://doi.org/10.1021/acsmaterialsau.2c00075",
language = "English",
journal = "ACS materials Au",
issn = "2694-2461",
publisher = "American Chemical Society",
}