Reductive Thermal Atomic Layer Deposition Process for Gold

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Originalspråk	engelska
Tidskrift	ACS materials Au
DOI	https://doi.org/10.1021/acsmaterialsau.2c00075
Status	Publicerad - 11 jan. 2023
MoE-publikationstyp	A1 Tidskriftsartikel-refererad

Vetenskapsgrenar

@article{29f29cd61db84d7d934cc3f3fd24cbe1,

title = "Reductive Thermal Atomic Layer Deposition Process for Gold",

keywords = "116 Chemical sciences, Atomic layer deposition (ALD), Thin film deposition, Gold, Reducing agent",

author = "Anton Vihervaara and Timo Hatanp{\"a}{\"a} and Heta Nieminen and Kenichiro Mizohata and Mykhailo Chundak and Mikko Ritala",

year = "2023",

month = jan,

day = "11",

doi = "https://doi.org/10.1021/acsmaterialsau.2c00075",

language = "English",

journal = "ACS materials Au",

issn = "2694-2461",

publisher = "American Chemical Society",

}

TY - JOUR

T1 - Reductive Thermal Atomic Layer Deposition Process for Gold

AU - Vihervaara, Anton

AU - Hatanpää, Timo

AU - Nieminen, Heta

AU - Mizohata, Kenichiro

AU - Chundak, Mykhailo

AU - Ritala, Mikko

PY - 2023/1/11

Y1 - 2023/1/11

KW - 116 Chemical sciences

KW - Atomic layer deposition (ALD)

KW - Thin film deposition

KW - Gold

KW - Reducing agent

U2 - https://doi.org/10.1021/acsmaterialsau.2c00075

DO - https://doi.org/10.1021/acsmaterialsau.2c00075

M3 - Article

JO - ACS materials Au

JF - ACS materials Au

SN - 2694-2461

ER -